Semiconductor production involves corrosive chemicals, abrasive slurries, and process wastewater that need careful handling. Diaphragm pumps keep the fluid separated from the drive mechanism, reducing leakage risk and supporting cleaner, safer transfer in applications such as:

• Wafer Grinding and Polishing: Slurries used in these processes contain silicon powder and abrasive particles. Diaphragm pumps, with their wide flow paths and lack of rotating components, can circulate these slurries efficiently while minimizing the risk of clogging. They are also used for collecting spent slurries and waste fluids.
• Wet Chemical Etching: Processes such as crystal etching and back-thinning of silicon wafers require acids, bases, and organic etchants. PTFE diaphragm pumps offer excellent chemical resistance and are able to transfer highly corrosive reagents safely, which is suitable for these critical steps.
• Back-Thinning Processes: Diaphragm pumps can handle acid and alkali transfer, slurry collection, and waste acid transport during grinding, polishing, and etching stages of back-thinning. This ensures both operational reliability and containment of hazardous fluids.